Chemical Mechanical Polishing of Titanium Alloy Based on Transmission Electron Microscopy

  • Lei Qiu, Shiming Ji, Xi Zeng et al.


As titanium alloys are widely used in many industrial fields such as microelectronics, the problems of low chemical mechanical polishing precision and low reliability have become increasingly prominent. In order to effectively analyze the problems of low visibility and low resolution during chemical mechanical polishing, this paper planarizes the Ti-6Al-4V titanium alloy by chemical mechanical polishing (CMP) method and obtains the roughness. Nano-scale smooth surface, and the mechanism of alloy CMP was studied by electrochemical and X-ray photoelectron spectroscopy (XPS). It is found that the Ti-6Al-4V polishing solution has a pH of 3.5~4.5. After 20 min polishing, the surface roughness Ra and rms are 0.684 nm and 0.856 nm. The electrochemical results show that the acidic solution can promote the corrosion of Ti-6Al-4V. The reaction rate increases with the increase of H2O2 concentration. The experimental results are consistent with the experimental results of CMP removal rate. The XPS spectrum analysis shows that the main components of Ti-6Al-4V surface after immersion and after CMP are TiO2 and Al2O3. A very small amount of TiO, Ti2O3 and VO2, and the surface of the surface at 10 nm depths are Ti, Al and V metal elements, indicating that an oxide film is formed on the surface of the titanium alloy under the action of the polishing liquid.